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US Patent 8845810 Substrate damage prevention system and method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
October 18, 2007
Date of Patent
September 30, 2014
Patent Application Number
11874365
Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 12080587 Apparatus for preventing backside peeling defects on semiconductor wafers
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
0
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US Patent 11694876 Apparatus and method for delivering a plurality of waveform signals during plasma processing
0
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8845810
Patent Primary Examiner
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Maureen Gramaglia

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