Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Christophe Martinez0
Fabien Laulagnet0
Pascal Boulitreau0
Date of Patent
March 25, 2014
0Patent Application Number
136298690
Date Filed
September 28, 2012
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An installation and method for etching at least one wafer coated with an etch-ready, blank photosensitive layer is disclosed. In accordance with an embodiment, the wafer has thickness irregularities, wherein the wafer is arranged to be able to be submitted to irradiation-beam scanning, a sheet transparent to the radiation to which the photosensitive layer is sensitive covers the wafer, and a probe beam intended to reflect on the upper portion of the sheet perpendicularly to the irradiation beam spot on the photosensitive layer is provided.
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