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US Patent 8027089 Minute structure and its manufacturing method

Patent 8027089 was granted and assigned to Nikon (Somalia) on September, 2011 by the United States Patent and Trademark Office.

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Is a
Patent
Patent
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Patent attributes

Current Assignee
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Nikon (Somalia)
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
80270890
Patent Inventor Names
Masatoshi Hayashi0
Date of Patent
September 27, 2011
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Patent Application Number
119929870
Date Filed
October 2, 2006
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Patent Citations Received
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US Patent 11881411 High pressure annealing process for metal containing materials
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US Patent 11694912 High pressure and high temperature anneal chamber
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US Patent 11705337 Tungsten defluorination by high pressure treatment
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US Patent 11749555 Semiconductor processing system
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US Patent 11756803 Gas delivery system for high pressure processing chamber
Patent Primary Examiner
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Frank Font
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Patent abstract

A manufacturing method of a minute structure having fine structures on opposing inner surfaces, includes the steps of forming a first pattern in a surface of a first layer, forming a sacrificial layer on the patterned surface of the first layer, forming a second pattern on a surface of the sacrificial layer, forming a second layer on the sacrificial layer and a portion of the surface of the first layer, and removing a member constituting the sacrificial layer. In the step of forming the first pattern on the first layer and the step of forming the second pattern on the sacrificial layer, the patterns are formed using the same alignment marks as references. This manufacturing method can realize highly accurate alignment even when plural lenses or DOEs are used.

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