US Patent 7966585 Selective shielding for multiple exposure masks

Patent 7966585 was granted and assigned to Mentor Graphics on June, 2011 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

Is a

Patent

Patent attributes

Current Assignee

Mentor Graphics

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7966585

Date of Patent

June 21, 2011

Patent Application Number

11610414

Date Filed

December 13, 2006

Patent Primary Examiner

‌

Naum Levin

Patent abstract

A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.