US Patent 7959820 Substrate processing method and substrate processing apparatus
Patent 7959820 was granted and assigned to Dainippon Screen Mfg Co on June, 2011 by the United States Patent and Trademark Office.
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Patent abstract
According to the substrate processing method of the invention, a jet of droplets generated from a gas and a heated processing liquid is supplied to the surface of a substrate. A resist stripping liquid to strip off the resist from the surface of the substrate is then supplied to the surface of the substrate.
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Patent Inventor Names
Akio Hashizume0
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US Patent 07959820 Substrate processing method and substrate processing apparatus US Patent 7959820 Substrate processing method and substrate processing apparatus
Infobox
Patent Number
079598200
Patent Number
79598200
Edits on 22 Mar, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079598200
Date of Patent
June 14, 2011
0Patent Application Number
115488550
Date Filed
October 12, 2006
0Patent Primary Examiner
Edits on 7 Dec, 2021
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Infobox (+8 properties)
US Patent 07959820 Substrate processing method and substrate processing apparatus
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07959820
Date of patent
June 14, 2011
Patent application number
11548855
Date Filed
October 12, 2006
Patent primary examiner
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