Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 24, 2011
Patent Application Number
12548471
Date Filed
August 27, 2009
Patent Primary Examiner
Patent abstract
A method of manufacturing a semiconductor device includes a process of forming a STI trench in a substrate, a process of forming a thermal oxide film on a sidewall and a bottom surface of the STI trench, a process of performing a plasma treatment on a surface of the thermal oxide film that is located at a bottom portion of the STI trench, and a process of forming an insulating film in the STI trench using a CVD method.
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