US Patent 7910177 Sequential pulse deposition
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Patent abstract
A method for growing films on substrates using sequentially pulsed precursors and reactants, system and devices for performing the method, semiconductor devices so produced, and machine readable media containing the method.
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Patent Inventor Names
Weimin Li0
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US Patent 07910177 Sequential pulse deposition US Patent 7910177 Sequential pulse deposition
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Patent Number
07910177
Patent Number
7910177
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Official Website
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US Patent 07910177 Sequential pulse deposition
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Is a
Patent jurisdiction
Patent number
07910177
Date of patent
March 22, 2011
Patent application number
11496093
Date Filed
July 31, 2006
Patent primary examiner
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