US Patent 7910167 Method of forming a film on a substrate

A film-forming method of forming a film on a substrate includes performing a surface-improving treatment on the substrate, determining whether a predetermined amount of time has passed since the surface-improving treatment has been performed on the substrate, applying a film-forming solution to the substrate when it is determined that the predetermined amount of time has not passed, and repeating the surface-improving treatment on the substrate when it is determined that the predetermined amount of time has passed.