US Patent 7829638 Antireflective hardmask composition and methods for using same
Patent 7829638 was granted and assigned to Cheil Industries on November, 2010 by the United States Patent and Trademark Office.
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Patent abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.
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Patent Inventor Names
Chang Il Oh0
Do Hyeon Kim0
Dong Seon Uh0
Irina Nam0
Jin Kuk Lee0
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US Patent 07829638 Antireflective hardmask composition and methods for using same US Patent 7829638 Antireflective hardmask composition and methods for using same
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Patent Number
078296380
Patent Number
78296380
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
078296380
Date of Patent
November 9, 2010
0Patent Application Number
113482030
Date Filed
February 6, 2006
0Official Website
Patent Primary Examiner
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US Patent 07829638 Antireflective hardmask composition and methods for using same
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07829638
Date of patent
November 9, 2010
Patent application number
11348203
Date Filed
February 6, 2006
Patent primary examiner
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