Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Do Hyeon Kim0
Jin Kuk Lee0
Irina Nam0
Chang Il Oh0
Dong Seon Uh0
Date of Patent
November 9, 2010
0Patent Application Number
113482030
Date Filed
February 6, 2006
0Patent Primary Examiner
Patent abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided.
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