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US Patent 7806078 Plasma treatment apparatus

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
December 7, 2006
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Date of Patent
October 5, 2010
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Patent Application Number
11608130
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Patent Citations Received
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US Patent 12126143 Method of manufacture for an ultraviolet emitting optoelectronic device
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US Patent 12009228 Low temperature chuck for plasma processing systems
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US Patent 12020905 Method of using high density plasma chemical vapor deposition chamber
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US Patent 12087553 Gas supply ring and substrate processing apparatus
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US Patent 11705689 Gallium and nitrogen bearing dies with improved usage of substrate material
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US Patent 11710944 Manufacturable RGB laser diode source and system
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US Patent 11715927 Manufacturable laser diodes on a large area gallium and nitrogen containing substrate
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US Patent 11715931 Strained and strain control regions in optical devices
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US Patent 11749969 Laser devices using a semipolar plane
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US Patent 11788699 Fiber-delivered laser-induced dynamic light system
•••
Patent Inventor Names
Kazuto Yoshida
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
7806078
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Patent Primary Examiner
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Rudy Zervigon
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