Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kazuto Yoshida0
Date of Patent
October 5, 2010
0Patent Application Number
116081300
Date Filed
December 7, 2006
0Patent Citations Received
0
...
Patent Primary Examiner
Patent abstract
A plasma CVD apparatus has a container, and channels composed of introduction grooves and circumferential grooves for different types of gases are formed within the container. The gases introduced through source gas piping, auxiliary gas piping, and cleaning gas piping are equally supplied to a plurality of supply nozzles, a plurality of auxiliary gas supply nozzles, and a plurality of cleaning gas nozzles. The configuration of the container can be simplified without complicating pipings for the gases.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
