US Patent 7799238 Plasma processing method and plasma processing apparatus
Patent 7799238 was granted and assigned to Tokyo Electron on September, 2010 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
April 30, 2009
Date of Patent
September 21, 2010
Patent Application Number
12433112
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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