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US Patent 7799238 Plasma processing method and plasma processing apparatus

Patent 7799238 was granted and assigned to Tokyo Electron on September, 2010 by the United States Patent and Trademark Office.

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Current Assignee
Tokyo Electron
Tokyo Electron
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7799238
Date of Patent
September 21, 2010
Patent Application Number
12433112
Date Filed
April 30, 2009
Patent Primary Examiner
‌
Allan Olsen
Patent abstract

A plasma processing method for performing a plasma process on a substrate to be processed by making a plasma act thereon includes the following sequential steps of making a plasma weaker than one used in the plasma process act on the substrate, applying a DC voltage to an electrostatic chuck for attracting and holding the substrate while the weak plasma acts on the substrate, extinguishing the weak plasma, and performing the plasma process. Further, a plasma processing apparatus includes a plasma processing mechanism for performing a plasma process on a substrate to be processed, and a controller for controlling the plasma processing mechanism to thereby perform the plasma processing method.

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