Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 10, 2010
Patent Application Number
10586048
Date Filed
July 28, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method for conducting a laser process homogeneously to the whole surface of a semiconductor film. A first laser beam emitted from a first laser oscillator passes through a slit and a condensing lens and then enters an irradiation surface. At the same time, a second laser beam emitted from a second laser oscillator is delivered so as to overlap the first laser beam on the irradiation surface. Further, the laser beams are scanned relative to the irradiation surface to anneal the irradiation surface homogeneously.
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