US Patent 7763355 Device manufacturing method, top coat material and substrate
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Patent abstract
In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, dl, dtc, and dr, and refractive indices, nl, ntc and nr, of the immersion fluid, topcoat and resist may meet the following criteria:nl≦ntc≦nr dl>˜5.λdtc≦˜5.λ.
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US Patent 07763355 Device manufacturing method, top coat material and substrate US Patent 7763355 Device manufacturing method, top coat material and substrate
Infobox
Patent Number
0776335500
Patent Number
776335500
Edits on 6 Apr, 2023
Golden AI
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Patent Jurisdiction
Patent Number
077633550
Date of Patent
July 27, 2010
0Patent Application Number
122920310
Date Filed
November 10, 2008
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
077633550
Date of Patent
July 27, 2010
0Patent Application Number
122920310
Date Filed
November 10, 2008
0Official Website
Patent Primary Examiner
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US Patent 07763355 Device manufacturing method, top coat material and substrate
Infobox
Is a
Patent jurisdiction
Patent number
07763355
Date of patent
July 27, 2010
Patent application number
12292031
Date Filed
November 10, 2008
Patent primary examiner
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