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Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 27, 2010
Patent Application Number
12292031
Date Filed
November 10, 2008
Patent Primary Examiner
Patent abstract
In immersion lithography, to avoid internal reflections in the final element of the projection system, immersion fluid and topcoat, the thicknesses, dl, dtc, and dr, and refractive indices, nl, ntc and nr, of the immersion fluid, topcoat and resist may meet the following criteria:nl≦ntc≦nr dl>˜5.λdtc≦˜5.λ.
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