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US Patent 7728356 P-GaN/AlGaN/AlN/GaN enhancement-mode field effect transistor

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Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7728356
Date of Patent
June 1, 2010
Patent Application Number
12131704
Date Filed
June 2, 2008
Patent Citations Received
‌
US Patent 12094931 Semiconductor device and method for manufacturing the same
0
‌
US Patent 11749740 High electron mobility transistor and method for fabricating the same
Patent Primary Examiner
‌
Tan N. Tran
Patent abstract

An enhancement mode High Electron Mobility Transistor (HEMT) comprising a p-type nitride layer between the gate and a channel of the HEMT, for reducing an electron population under the gate. The HEMT may also comprise an Aluminum Nitride (AlN) layer between an AlGaN layer and buffer layer of the HEMT to reduce an on resistance of a channel.

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