US Patent 7674725 Treatment solution and method of applying a passivating layer
Patent 7674725 was granted and assigned to Freescale Semiconductor on March, 2010 by the United States Patent and Trademark Office.
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Patent abstract
A treatment solution for a semiconductor wafer comprising water, a passivating reagent and a surfactant. The treatment solution is either mixed with a cleaning fluid, a rinsing fluid or a drying vapor, and is used in a cleaning apparatus employing a Marangoni dryer.
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Patent Inventor Names
Janos Farkas0
Sebastien Petitdidier0
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US Patent 07674725 Treatment solution and method of applying a passivating layer US Patent 7674725 Treatment solution and method of applying a passivating layer
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Patent Number
07674725
Patent Number
7674725
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Official Website
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US Patent 07674725 Treatment solution and method of applying a passivating layer
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Is a
Current assignee
Patent jurisdiction
Patent number
07674725
Date of patent
March 9, 2010
Patent application number
11914878
Date Filed
May 25, 2005
Patent primary examiner
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