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US Patent 7674725 Treatment solution and method of applying a passivating layer

Patent 7674725 was granted and assigned to Freescale Semiconductor on March, 2010 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors

Is a

Patent

Patent attributes

Current Assignee

Freescale Semiconductor

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7674725

Patent Inventor Names

Sebastien Petitdidier1

Janos Farkas1

Date of Patent

March 9, 2010

Patent Application Number

11914878

Date Filed

May 25, 2005

Patent Primary Examiner

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Kevin M. Picardat

Patent abstract

A treatment solution for a semiconductor wafer comprising water, a passivating reagent and a surfactant. The treatment solution is either mixed with a cleaning fluid, a rinsing fluid or a drying vapor, and is used in a cleaning apparatus employing a Marangoni dryer.