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US Patent 7651959 Method for forming silazane-based dielectric film

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
December 3, 2007
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Date of Patent
January 26, 2010
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Patent Application Number
11949701
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Patent Citations Received
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US Patent 11881411 High pressure annealing process for metal containing materials
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US Patent 11705337 Tungsten defluorination by high pressure treatment
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US Patent 11749555 Semiconductor processing system
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US Patent 11756803 Gas delivery system for high pressure processing chamber
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US Patent 11786930 Protective coating
Patent Inventor Names
Atsuki Fukazawa
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Jeongseok Ha
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Nobuo Matsuki
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
7651959
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Patent Primary Examiner
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Charles D. Garber
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