US Patent 7641468 Imprint lithography apparatus and method employing an effective pressure

An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.