Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 5, 2010
Patent Application Number
10931672
Date Filed
September 1, 2004
Patent Primary Examiner
Patent abstract
An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.
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