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US Patent 7632622 Antireflective hardmask composition and methods for using same

Patent 7632622 was granted and assigned to Cheil Industries on December, 2009 by the United States Patent and Trademark Office.

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Patent abstract

Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer mixture includinga first polymer that includes one or more of the following monomeric units

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