Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chang Il Oh1
Dong Sun Uh1
Do Hyeon Kim1
Ji Young Jung1
Jae Min Oh1
Date of Patent
December 15, 2009
1Patent Application Number
113010491
Date Filed
December 12, 2005
1Patent Primary Examiner
Patent abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer mixture includinga first polymer that includes one or more of the following monomeric units
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