US Patent 7632622 Antireflective hardmask composition and methods for using same
Patent 7632622 was granted and assigned to Cheil Industries on December, 2009 by the United States Patent and Trademark Office.
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Patent Inventor Names
Chang Il Oh0
Do Hyeon Kim0
Dong Sun Uh0
Jae Min Oh0
Ji Young Jung0
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Patent abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:(a) a polymer mixture includinga first polymer that includes one or more of the following monomeric units
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US Patent 07632622 Antireflective hardmask composition and methods for using same US Patent 7632622 Antireflective hardmask composition and methods for using same
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Patent Number
076326220
Patent Number
76326220
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
076326220
Date of Patent
December 15, 2009
0Patent Application Number
113010490
Date Filed
December 12, 2005
0Official Website
Patent Primary Examiner
Edits on 18 Jun, 2022
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US Patent 07632622 Antireflective hardmask composition and methods for using same
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07632622
Date of patent
December 15, 2009
Patent application number
11301049
Date Filed
December 12, 2005
Patent primary examiner
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