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US Patent 7608367 Vitreous carbon mask substrate for X-ray lithography

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
July 28, 2005
Date of Patent
October 27, 2009
Patent Application Number
11192797
Patent Citations Received
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US Patent 12125711 Reducing roughness of extreme ultraviolet lithography resists
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US Patent 11921427 Methods for making hard masks useful in next-generation lithography
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US Patent 11988965 Underlayer for photoresist adhesion and dose reduction
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US Patent 12062538 Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement
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US Patent 12105422 Photoresist development with halide chemistries
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Patent Inventor Names
Dawn M. Skala
0
Georg Aigeldinger
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Matthew W. Losey
0
Stewart K. Griffiths
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Albert Alec Talin
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Chu-Yeu Peter Yang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7608367
Patent Primary Examiner
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Mark F. Huff

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