US Patent 7600522 Substrate treatment method and substrate treatment apparatus
Patent 7600522 was granted and assigned to Dainippon Screen Mfg Co on October, 2009 by the United States Patent and Trademark Office.
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Patent Inventor Names
Masanobu Sato0
Sadao Hirae0
Shuichi Yasuda0
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Patent abstract
A substrate treatment method including the steps of: generating droplets of a treatment liquid by mixing the treatment liquid with a gas; and causing the treatment liquid droplets generated in the liquid droplet generating step to impinge on a surface of a substrate being treated. The treatment liquid droplets have a volume median diameter of 5 μm to 40 μm.
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US Patent 07600522 Substrate treatment method and substrate treatment apparatus US Patent 7600522 Substrate treatment method and substrate treatment apparatus
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Patent Number
07600522
Patent Number
7600522
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Official Website
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US Patent 07600522 Substrate treatment method and substrate treatment apparatus
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Is a
Current assignee
Patent jurisdiction
Patent number
07600522
Date of patent
October 13, 2009
Patent application number
12397632
Date Filed
March 4, 2009
Patent primary examiner
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