US Patent 7595931 Grating for EUV lithographic system aberration measurement

Patent 7595931 was granted and assigned to ASML Holding on September, 2009 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

ASML Holding

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7595931

Date of Patent

September 29, 2009

Patent Application Number

11037178

Date Filed

January 19, 2005

Patent Primary Examiner

‌

Stephone B. Allen

Patent abstract

A grating includes an absorptive substrate and a plurality of reflective lines on the absorptive substrate. Each reflective line is formed by a plurality of reflective areas. The reflective areas can be arranged in a regular pattern. The reflective areas are between 70 nm and 120 nm in diameter. The reflective areas can be circular. The reflective areas can have a random height distribution.