US Patent 7595521 Terraced film stack
Patent 7595521 was granted and assigned to Micron Technology on September, 2009 by the United States Patent and Trademark Office.
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Patent Inventor Names
Alex Schrinsky0
Robert J. Hanson0
Terry McDaniel0
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Article (+330 characters)
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Patent abstract
A process and apparatus directed to forming a terraced film stack of a semiconductor device, for example, a DRAM memory device, is disclosed. The present invention addresses etch undercut resulting from materials of different etch selectivity used in the film stack, which if not addressed can cause device failure.
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US Patent 07595521 Terraced film stack US Patent 7595521 Terraced film stack
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Patent Number
075955210
Patent Number
75955210
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Official Website
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
075955210
Date of Patent
September 29, 2009
0Patent Application Number
122748240
Date Filed
November 20, 2008
0Official Website
Patent Primary Examiner
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US Patent 07595521 Terraced film stack
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07595521
Date of patent
September 29, 2009
Patent application number
12274824
Date Filed
November 20, 2008
Patent primary examiner
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