Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Danielle Megan King Curzi0
Peng Zhang0
Leslie Cox Barber0
Eugene Joseph Karwacki, Jr.0
Date of Patent
September 22, 2009
Patent Application Number
11520971
Date Filed
September 14, 2006
Patent Primary Examiner
Patent abstract
Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of semiconductor devices.
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