US Patent 7585800 Silica glass and optical material

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Edits on 17 Sep, 2023

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edited on 17 Sep, 2023

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Patent Inventor Names

Akira Takada0

Hideaki Hayashi0

Mitsuhiro Kawata0

Naoki Sugimoto0

Shinya Kikugawa0

Edits on 16 Sep, 2023

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edited on 16 Sep, 2023

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Patent abstract

It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness.

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edited on 22 May, 2023

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=07585800

Edits on 18 May, 2023

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