Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shinya Kikugawa0
Hideaki Hayashi0
Mitsuhiro Kawata0
Naoki Sugimoto0
Akira Takada0
Date of Patent
September 8, 2009
Patent Application Number
11962936
Date Filed
December 21, 2007
Patent Primary Examiner
Patent abstract
It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100° C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness.
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