Patent 7551979 was granted and assigned to Strasbaugh on June, 2009 by the United States Patent and Trademark Office.
A robot calibration system and method for robots in semiconductor wafer processing systems is disclosed. The calibration system comprises a calibration array, a dummy wafer and a control system programmed with a calibration routine. The calibration array has an plurality of inductive proximity sensors to determine parallelism of the robot relative to a station and a center locating sensor to determine the center of the station.