US Patent 7547465 Multi-station deposition apparatus and method

Patent 7547465 was granted and assigned to Applied Materials on June, 2009 by the United States Patent and Trademark Office.

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Lawrence C. Lei0

Mei Chang0

Walter B. Glenn0

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Patent abstract

A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates the wafers into specific deposition positions at which deposition gases are supplied to the wafers. The deposition gases may be supplied to the wafer through single zone or multi-zone gas dispensing nozzles.

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