Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Walter B. Glenn0
Lawrence C. Lei0
Mei Chang0
Date of Patent
June 16, 2009
Patent Application Number
11198140
Date Filed
August 5, 2005
Patent Primary Examiner
Patent abstract
A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates the wafers into specific deposition positions at which deposition gases are supplied to the wafers. The deposition gases may be supplied to the wafer through single zone or multi-zone gas dispensing nozzles.
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