US Patent 7531415 Multilayered CMP stop for flat planarization

Patent 7531415 was granted and assigned to Texas Instruments on May, 2009 by the United States Patent and Trademark Office.

Overview Structured Data Issues Contributors Activity

All edits

Edits on 17 Sep, 2023

"Add patent inventor(s)"

Golden AI

edited on 17 Sep, 2023

Edits made to:

Infobox (+1 properties)

Infobox

Patent Inventor Names

Siang Ping Kwok0

Edits on 15 Sep, 2023

"Add patent abstract"

Golden AI

edited on 15 Sep, 2023

Edits made to:

Article (+358 characters)

Article

Patent abstract

A three layer film (116/114/112), such as nitride/oxide/nitride for a CMP stop layer (110). A gap filling material (120) is polished, stopping on the first film (112). The first film (112) is then stripped using an etch chemistry that is selective against removing the second film (114). CMP is then continued stopping on the third film (116).

Edits on 26 May, 2023

"Remove website redirecting to Patent Public Search front page"

Golden AI

edited on 26 May, 2023

Edits made to:

Infobox (-1 properties)

Infobox

Official Website

https://pdfpiw.uspto.gov/.piw?Docid=07531415

Edits on 24 May, 2023

"Remove leading 0 from patent number"

Golden AI