US Patent 7510817 Photoresist polymer compositions
Patent 7510817 was granted and assigned to JSR Corporation on March, 2009 by the United States Patent and Trademark Office.
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Patent abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
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US Patent 07510817 Photoresist polymer compositions US Patent 7510817 Photoresist polymer compositions
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Patent Number
0751081700
Patent Number
751081700
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075108170
Date of Patent
March 31, 2009
0Patent Application Number
113006570
Date Filed
December 12, 2005
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075108170
Date of Patent
March 31, 2009
0Patent Application Number
113006570
Date Filed
December 12, 2005
0Official Website
Patent Primary Examiner
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US Patent 07510817 Photoresist polymer compositions
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07510817
Date of patent
March 31, 2009
Patent application number
11300657
Date Filed
December 12, 2005
Patent primary examiner
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