US Patent 7473613 Terraced film stack
Patent 7473613 was granted and assigned to Micron Technology on January, 2009 by the United States Patent and Trademark Office.
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Patent Inventor Names
Alex Schrinsky0
Robert J. Hanson0
Terry McDaniel0
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Article (+316 characters)
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Patent abstract
A process directed to forming a terraced film stack of a semiconductor device, for example, a DRAM memory device, is disclosed. The present invention addresses etch undercut resulting from materials of different etch selectivity used in the film stack, which if not addressed can cause device failure.
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US Patent 07473613 Terraced film stack US Patent 7473613 Terraced film stack
Infobox
Patent Number
074736130
Patent Number
74736130
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
074736130
Date of Patent
January 6, 2009
0Patent Application Number
117575940
Date Filed
June 4, 2007
0Official Website
Patent Primary Examiner
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US Patent 07473613 Terraced film stack
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07473613
Date of patent
January 6, 2009
Patent application number
11757594
Date Filed
June 4, 2007
Patent primary examiner
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