Log in
Sign up
Golden has been acquired by ComplyAdvantage.Read about it here ⟶
‌

US Patent 7440301 High frequency excitation system

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
December 13, 2006
0
Date of Patent
October 21, 2008
0
Patent Application Number
11610091
0
Patent Citations Received
‌
US Patent 12125673 Pulsed voltage source for plasma processing applications
0
‌
US Patent 11967483 Plasma excitation with ion energy control
0
‌
US Patent 11972924 Pulsed voltage source for plasma processing applications
0
‌
US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
0
‌
US Patent 12111341 In-situ electric field detection method and apparatus
0
‌
US Patent 11776788 Pulsed voltage boost for substrate processing
‌
US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
‌
US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
‌
US Patent 11887813 Pulsed voltage source for plasma processing
0
‌
US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
0
Patent Inventor Names
Thomas Kirchmeier
0
Wolfgang R. Oestreicher
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
7440301
0
Patent Primary Examiner
‌
Matthew V. Nguyen
0

Find more entities like US Patent 7440301 High frequency excitation system

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo
By using this site, you agree to our Terms of Service.