US Patent 7429526 Method of forming silicide gate with interlayer
Patent 7429526 was granted and assigned to Xilinx on September, 2008 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
July 11, 2006
0
Date of Patent
September 30, 2008
0
Patent Application Number
11484193
0
Patent Inventor Names
Yuhao Luo
0
Deepak Kumar Nayak
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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