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US Patent 7317606 Particle trap for electrostatic chuck

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Patent Citations Received
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US Patent 12002701 Electrostatic chuck assembly for plasma processing apparatus
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Patent Inventor Names
Eitan Kidron0
Guy Eitan0
Igal Ben-Dayan0
Igor Krivts (Krayvitz)0
Igor Petrov0
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Patent abstract

Wafer supporting apparatus, including an electrostatic chuck for supporting the wafer. The apparatus further includes an electrostatic shield which is positioned in proximity to the chuck and the wafer, and a voltage source which is coupled to apply an electric field between the chuck and the wafer. The voltage source applies one or more potentials to the electrostatic shield so as to prevent penetration of particles to the wafer.

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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=073176060
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US Patent 07317606 Particle trap for electrostatic chuck US Patent 7317606 Particle trap for electrostatic chuck

Infobox
Patent Number
073176060
Patent Number
73176060
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Infobox
Is a
Patent
Patent
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
073176060
Date of Patent
January 8, 2008
0
Patent Application Number
111193160
Date Filed
April 28, 2005
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=073176060
Patent Primary Examiner
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Ronald W. Leja
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Edits on 17 Jun, 2022
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07317606
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created this topic on 23 Nov, 2021
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 US Patent 07317606 Particle trap for electrostatic chuck

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07317606
Date of patent
January 8, 2008
Patent application number
11119316
Date Filed
April 28, 2005
Patent primary examiner
‌
Ronald W. Leja

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