US Patent 7285491 Salicide process
Patent 7285491 was granted and assigned to United Microelectronics Corporation on October, 2007 by the United States Patent and Trademark Office.
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Patent Inventor Names
Ching-Hsing Hsieh0
Min-Hsian Chen0
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Patent abstract
A salicide process is provided. A metal layer selected from a group consisting of nickel and an alloy thereof is formed on a silicon layer, the first step of the second thermal process is performed at 300˜400 degrees centigrade for 10˜60 seconds and the second step of the second thermal process is performed at 450˜550 degrees centigrade for 10˜60 seconds.
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US Patent 07285491 Salicide process US Patent 7285491 Salicide process
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Patent Number
072854910
Patent Number
72854910
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Official Website
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Current Assignee
0
Patent Jurisdiction
Patent Number
072854910
Date of Patent
October 23, 2007
0Patent Application Number
115534770
Date Filed
October 27, 2006
0Official Website
Patent Primary Examiner
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US Patent 07285491 Salicide process
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07285491
Date of patent
October 23, 2007
Patent application number
11553477
Date Filed
October 27, 2006
Patent primary examiner
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