Is a
Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ching-Hsing Hsieh0
Min-Hsian Chen0
Date of Patent
October 23, 2007
0Patent Application Number
115534770
Date Filed
October 27, 2006
0Patent Primary Examiner
Patent abstract
A salicide process is provided. A metal layer selected from a group consisting of nickel and an alloy thereof is formed on a silicon layer, the first step of the second thermal process is performed at 300˜400 degrees centigrade for 10˜60 seconds and the second step of the second thermal process is performed at 450˜550 degrees centigrade for 10˜60 seconds.
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