US Patent 7175713 Apparatus for cyclical deposition of thin films
Patent 7175713 was granted and assigned to Applied Materials on February, 2007 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
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US Patent 07175713 Apparatus for cyclical deposition of thin films US Patent 7175713 Apparatus for cyclical deposition of thin films
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Patent Number
0717571300
Patent Number
717571300
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
071757130
Date of Patent
February 13, 2007
0Patent Application Number
103522570
Date Filed
January 27, 2003
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071757130
Date of Patent
February 13, 2007
0Patent Application Number
103522570
Date Filed
January 27, 2003
0Official Website
Patent Primary Examiner
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US Patent 07175713 Apparatus for cyclical deposition of thin films
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07175713
Date of patent
February 13, 2007
Patent application number
10352257
Date Filed
January 27, 2003
Patent primary examiner
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