Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
February 13, 2007
Patent Application Number
10352257
Date Filed
January 27, 2003
Patent Citations Received
Patent Primary Examiner
Patent abstract
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
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