US Patent 7169717 Method of producing a calibration wafer
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Patent Inventor Names
Christoph Merkl0
Markus Hauf0
Rolf Bremensdorfer0
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Patent abstract
A method of producing a calibration wafer having at least a predetermined emissivity, including providing a wafer of semiconductor material; subjecting the bulk material of the wafer to doping with foreign atoms and/or generating lattice defects to obtain the predetermined emissivity; and coating the wafer to obtain a further optical characteristic.
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US Patent 07169717 Method of producing a calibration wafer US Patent 7169717 Method of producing a calibration wafer
Infobox
Patent Number
071697170
Patent Number
71697170
Edits on 30 Mar, 2023
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Patent Jurisdiction
Patent Number
071697170
Date of Patent
January 30, 2007
0Patent Application Number
105367880
Date Filed
November 13, 2003
0Official Website
Patent Primary Examiner
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US Patent 07169717 Method of producing a calibration wafer
Infobox
Is a
Patent jurisdiction
Patent number
07169717
Date of patent
January 30, 2007
Patent application number
10536788
Date Filed
November 13, 2003
Patent primary examiner
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