Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
David Cooperberg0
Vahid Vahedi0
Date of Patent
November 21, 2006
0Patent Application Number
109329260
Date Filed
September 1, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for enhancing a process and profile simulator algorithm predicts the surface profile that a given plasma process will create. An energetic particle is first tracked. The ion fluxes produced by the energetic particle are then recorded. A local etch rate and a local deposition rate are computed from neutral fluxes, surface chemical coverage, and surface material type that are solved simultaneously.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
