US Patent 7105886 High K dielectric film
Patent 7105886 was granted and assigned to Freescale Semiconductor on September, 2006 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
July 21, 2004
Date of Patent
September 12, 2006
Patent Application Number
10895552
Patent Jurisdiction
Patent Number
Patent Primary Examiner
Find more entities like US Patent 7105886 High K dielectric film
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
By using this site, you agree to our Terms of Service.