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US Patent 7056455 Process for the preparation of nanostructured materials

Patent 7056455 was granted and assigned to Carnegie Mellon University on June, 2006 by the United States Patent and Trademark Office.

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Patent
Patent
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Patent attributes

Current Assignee
Carnegie Mellon University
Carnegie Mellon University
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
70564550
Patent Inventor Names
Nicolay V. Tsarevsky0
David N. Lambeth0
James Spanswick0
Krzysztof Matyjaszewski0
Tomasz Kowalewski0
Date of Patent
June 6, 2006
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Patent Application Number
101185190
Date Filed
April 6, 2002
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Patent Citations Received
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US Patent 12012492 Multiblock copolymer films, methods of making same, and uses thereof
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US Patent 11912784 Methods of treating an eye disorder
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US Patent 12022642 Patterned electromagnetic interference (EMI) mitigation materials including carbon nanotubes
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US Patent 12071476 IL-6 antibodies and fusion constructs and conjugates thereof
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US Patent 12109541 Chemically resistant isoporous crosslinked block copolymer structure
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Patent Primary Examiner
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Stanley S. Silverman
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Patent abstract

The present invention comprises a novel process for the preparation of carbon based structured materials with controlled topology, morphology and functionality. The nanostructured materials are prepared by controlled carbonization, or pyrolysis, of precursors comprising phase separated copolymers. The precursor materials are selected to phase separate and self organize in bulk, in solution, in the presence of phase selective solvents, at surfaces, interfaces or during fabrication, into articles, fibers or films exhibiting well-defined, self-organized morphology or precursors of well-defined, self-organized, bi- or tri-phasic morphology. Compositional control over the (co)polymers provides control over the structure of the phase separated precursor whose organization therein dictates the nanostructure of the material obtained after carbonization or pyrolysis, wherein each dimension of the formed structure can be predetermined. When the precursor morphology is selected to comprise cylindrical domains this procedure additionally allows for the direct formation of two dimensional nanowire grids or arrays of oriented nanostructures on surfaces. When these nanowire grids or arrays are perpendicularly oriented to the surface applications include field emitters, high surface area electrodes, electronic devices such as diodes and transistors, tools for AMF tips and elements of molecular electronics. When the first nanostructured morphology is selected to form cylinders parallel to the surface then nanowire arrays are formed after pyrolysis. When the composition of the first nanostructured morphology is selected to comprise a continuous precursor matrix then a continuous carbon based nanostructured material is formed. The internal structure of the carbon based material can be selected to comprise perpendicular pores or an interconnected array of pores. The carbon based structures can additionally find application in photovoltaics, supercapacitors, batteries, fuel cells, computer memory, carbon electrodes, carbon foams, actuators and hydrogen storage.

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