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US Patent 12085520 Quantum-limited extreme ultraviolet coherent diffraction imaging
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Patent
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Date Filed
January 17, 2020
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Date of Patent
September 10, 2024
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Patent Application Number
17423869
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Patent Citations
US Patent 10346964 System for actinic inspection of semiconductor masks
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US Patent 10444623 Method and system for high-throughput defect inspection using the contrast in the reduced spatial frequency domain
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US Patent 10754140 Parallel imaging acquisition and restoration methods and systems
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US Patent 11002688 System for actinic inspection of semiconductor masks
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US Patent 11709132 Modulus-enforced probe
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US Patent 11347045 Ptychography based system and method
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US Patent 11885755 X-ray sequential array wavelength dispersive spectrometer
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US Patent 9891584 Coherent diffractive imaging with arbitrary angle of incidence
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US Patent 10088762 Inspection apparatus and method
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Patent Inventor Names
Margaret Murnane
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Henry C. Kapteyn
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Bin Wang
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Chen-Ting Liao
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
12085520
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Patent Primary Examiner
Allen C. Ho
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CPC Code
G01N 23/205
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G01N 23/2055
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G01N 23/20016
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G01N 23/20
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G01N 21/47
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G01N 23/20008
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G01N 23/20091
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